-
解决方案
-
Low-temperature plasma enhanced chemical vapour depo
发布:仕嘉科技(北京)有限公司浏览次数:447Vertically aligned carbon nanotubes were selectively grown at temperatures as low as 120 8C by plasma enhanced chemical vapour deposition.W e investigated the effects of acetylene, ethylene and methane as carbon source gases together with ammonia as an etchant and nickel as catalyst material.The diluted acetylene plasma gave the highest nanotube growth rate and showed the most intense C2 Swan bands in optical emission.The activation energy for the growth rate was found to be 0.23 eV, much less than for thermal chemical vapour deposition (1.21.5 eV).This suggests growth occurs by surface diffusion of carbon on nickel. The result allows more cost-effective nanotube production, direct growth of nanotubes onto low-temperature substrates like plastics, and could facilitate carbon nanotube integration into sensitive nanoelectronic devices. 2003 Elsevier B.V. All rights reserved. PECVD
2006-03-19上一篇:Patterned growth and field emission properties of ve
下一篇:Mechanical properties and quality of diamond films b相关仪器 -
免责声明
①本网刊载上述内容,并不代表本网赞同其观点或证实其内容的真实性,不承担此类作品侵权行为的直接责任及连带责任
②若本站内容侵犯到您的合法权益,请及时告诉,我们马上修改或删除。邮箱:hezou_yiqi
-
认证会员 第 10 年
仕嘉科技(北京)有限公司
认证:工商信息已核实
- 产品分类
- 品牌分类
-
仪企号仕嘉科技(北京)有限公司
-
友情链接
-
手机版开启全新的世界m.yiqi.com/zt2106/