纳米压印系统

纳米压印系统
EZImprinting introduces a bench-top, stand-alone nanoimprint platform.
This platform provides a mechanical stage with micro-positioning fixtures for mounting a nanoimprint chamber, UV-curing source, and alignment microscope.

It functions both as a nanoimprint system and as a traditional mask aligner while providing programmable, automatic control of your entire imprinting process.


EZImprinting Advantages 
•  Sub-10nm resolution with 99% yield
•  Supports both hard and soft molds
•  Variable mold and substrate sizes offer unparalleled convenience and flexibility
•  Auto-Release process prevents mold/substrate damage during separation and maximizes yield per imprint
•  Auto-Release process prevents mold/substrate damage during separation and maximizes yield per imprint
•  Versatile processes for a wide variety of applications:
•  optical devices, displays, data storage, biomedical
•  devices, semiconductor IC's, chemical synthesis, and advanced materials
•  Programmable PLC with touch-screen user interface allows process control through customized parameters
•  Proprietary UV-curable nanoimprint resist has no limitations on hardness or thickness, and is compatible with traditional photolithography processes