Local chemical grafting of OctadecylTriMethoxySilane (OTMS) on SiO2/Si substrates
has been successfully performed on specific micrometric areas by combining nano-imprint
lithography and Chemical Vapour Deposition (CVD). The optimisation of the CVD
experimental conditions using atomic force microscopy has lead to homogeneous 1 m square
arrays of OTMS monolayers on millimetric areas.
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