Analysis Example by Vacuum Model FT/IR (1)
Measurement of Silicon Wafer
(1/1)
No. 220TR0164-E
Due to the high refractive index of silicon wafer samples, there is a correspondingly high reflectance from the sample. If the
sample is placed directly in the sample compartment, vertical to the incident source beam, the reflection of the source returns to the
interferometer, is reflected by the beamsplitter and then illuminates the sample again. As a result, the sample pathlength of the
sample measurement is different from the background measurement and excessive noise is observed due to the atmospheric water
vapor, even with a purged instrument. While it is possible to adjust the angle of the sample with respect to the incident source
illumination, using an evacuated FT-IR instrument allows measurement of the sample vertical to the incident illumination without JASCO傅立叶变换红外光谱仪FT/IR-6000 JASCO FTIR-4000傅立叶变换红外光谱仪 jascoRFT-6000傅立叶变换红外拉曼光谱仪
在线留言
沪公网安备 31011502008050号
参与评论
登录后参与评论