The feasibility of using the MM-16 SE in measuring thickness and refractive index of AlN thin and thick films has been demonstrated. Non destructive measurement of thickness was successfully applied to films as thick as 3m deposited on Si. The multi-layer models with a surface layer with void and the simple dispersion gave useful information about surface roughness, film density and oxygen contamination. 研究级经典型椭偏仪 UVISEL
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