德国SUSS 紫外光刻机 MJB4

产品介绍：

        MJb4型号紫外光刻机是德国SUSS公司生产的手动型光刻机，在全球相关科研领域的实验室有广泛的应用。该设备配备可靠的在亚微米级高度精密的对准以及高分辨光刻系统。具备顶部对准系统和衍射减小光学系统。

Perfect Low-Cost Solution:

•  High Accuracy

•  Good Optical performance

•  latest processes (e.g. UV-NIL)

Addressed Markets:

•  MEMS

•  Telecommunications

•  Compound Semiconductors

•  Nano Imprint Lithography

Manual Tool: Easy To Operate

Technical Data

•  Wafer size: 1′′ up to 100 mm / 4′′ (round)

•  Min. pieces: 5 x 5 mm

•  Wafer thickness: up to 4 mm

•  Mask size: standard 2′′ x 2′′ up to 5′′ x 5′′ (SEMI)

•  Mask thickness: up to 4.8 mm / 190 mil

Exposure Modes

•  Contact: soft, hard, vacuum, soft vacuum

•  Proximity up to 50μm gap

Optics

•  UV250, UV300, UV400 and broadband optics

•  Intensity Uniformity ± 3% on 100mm

•  Constant power or constant intensity

•  Lamp sizes: 200W, 350W, 500W (for UV250)

•  Resolution down to 0,5 μm L/S (vacuum contact, UV250)

Alignment

•  TSA alignment accuracy: 0.5μm (with SUSS recommended wafer targets)

•  Transmitted IR Alignment accuracy: < 5μm (<2μm under special process conditions)

•  Alignment gap:10–50μm

Single or splitfield microscope with/w/o CCD camera